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la5b00568

la5b00568

la5b00568

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Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls

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Journal	Langmuir
Title	Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls
Manuscript #	la5b00568
Authors	Jin Wu Yayuan Liu Yuanyuan Guo Shuanglong Feng Binghua Zou Hui Mao Cheng-han Yu Danbi Tian Wei Huang Fengwei Huo
Pages	8.95

Additional Information

Additional Information

Journal	Langmuir
Title	Centimeter-Scale Subwavelength Photolithography Using Metal-Coated Elastomeric Photomasks with Modulated Light Intensity at the Oblique Sidewalls
Manuscript #	la5b00568
Authors	Jin Wu Yayuan Liu Yuanyuan Guo Shuanglong Feng Binghua Zou Hui Mao Cheng-han Yu Danbi Tian Wei Huang Fengwei Huo
Pages	8.95

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